Epitaxial growth of Gd2O3 on surfactant-mediated grown Ge films on Si(0 0 1) substrates

authored by
T. F. Wietler, A. Laha, E. Bugiel, M. Czernohorsky, R. Dargis, A. Fissel, H. J. Osten
Abstract

In this work, we investigated the epitaxial growth of Gd2O3 thin films on germanium layers grown by surfactant-mediated epitaxy on silicon (0 0 1) substrates. The influence of the lattice mismatch between Ge and Gd2O3 as well as the impact of the lower surface energy of Ge compared to Si on the growth process have been studied resulting in conditions for epitaxy of smooth Gd2O3 films without any interfacial layer on Ge. We determined the epitaxial relationship and the crystalline structure of these films using transmission electron microscopy and X-ray diffraction. The Gd2O3 layers grow in two orthogonal (0 1 1)-oriented domains of the cubic phase. They are relaxed and show structural perfection similar to that of Gd2O3 films grown on Si(0 0 1). No interfacial layer is observed between the Gd2O3 and Ge making this material combination particularly suitable for an application in high-mobility channel MOSFETs with equivalent oxide thickness below 1 nm.

Organisation(s)
Institute of Electronic Materials and Devices
Laboratorium f. Informationstechnologie
Type
Article
Journal
Solid-State Electronics
Volume
53
Pages
833-836
No. of pages
4
ISSN
0038-1101
Publication date
08.2009
Publication status
Published
Peer reviewed
Yes
ASJC Scopus subject areas
Electronic, Optical and Magnetic Materials, Condensed Matter Physics, Electrical and Electronic Engineering, Materials Chemistry
Electronic version(s)
https://doi.org/10.1016/j.sse.2009.04.027 (Access: Closed)