Influence of the number of double layers on the damage threshold of Al 2O3/SiO2 and LaF3/MgF2 mirrors at 248 nm

authored by
Eric Eva, Klaus R. Mann, Uwe B. Schallenberg, Norbert Kaiser, Rainer Henking, Detlev Ristau
Abstract

KrF-laser induced damage thresholds (LIDT) of HR stacks were investigated as a function of the number of quarterwave layers. The findings were interpreted in terms of calorimetric absorption measurements and scatter defect density counts as well as an analysis of the standing wave electric field. Higher numbers of high-purity Al2O3/SiO2 layers resulted in enhanced LIDT by shielding the substrate surface increasingly well. Contrary to this, LIDT decreased with increasing numbers of e-beam evaporated LaF3/MgF2 layers. This was accompanied by elevated absorptance, defect density and conditionability at higher stack numbers.

External Organisation(s)
Laser-Laboratorium Göttingen e.V.
Fraunhofer Institute for Applied Optics and Precision Engineering (IOF)
Laser Zentrum Hannover e.V. (LZH)
Type
Conference contribution
Pages
499-510
No. of pages
12
Publication date
27.05.1996
Publication status
Published
Peer reviewed
Yes
ASJC Scopus subject areas
Electronic, Optical and Magnetic Materials, Condensed Matter Physics, Computer Science Applications, Applied Mathematics, Electrical and Electronic Engineering
Electronic version(s)
https://doi.org/10.1117/12.240365 (Access: Closed)