Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm
- authored by
- Eric Eva, Klaus Mann, Norbert Kaiser, B. Anton, Rainer Henking, Detlev Ristau, P. Weissbrodt, D. Mademann, L. Raupach, Erich Hacker
- Abstract
Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.
- External Organisation(s)
-
Laser-Laboratorium Göttingen e.V.
Fraunhofer Institute for Applied Optics and Precision Engineering (IOF)
Laser Zentrum Hannover e.V. (LZH)
JENOPTIK Laser GmbH
- Type
- Article
- Journal
- Applied Optics
- Volume
- 35
- Pages
- 5613-5619
- No. of pages
- 7
- ISSN
- 1559-128X
- Publication date
- 01.10.1996
- Publication status
- Published
- Peer reviewed
- Yes
- ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics, Engineering (miscellaneous), Electrical and Electronic Engineering
- Electronic version(s)
-
https://doi.org/10.1364/AO.35.005613 (Access:
Unknown)
