Microstructure and composition of MgF₂ optical coatings grown on Si substrate by PVD and IBS processes

verfasst von

D. Jacob, Francesca Peiró, E. Quesnel, Detlev Ristau

Abstract

MgF₂ is a current material for the optical applications in the UV and deep UV range. Nevertheless, modern applications still require improvement of the optical and structural quality of the deposited layers. In the present work, the composition and microstructure of MgF₂ single layers grown on Si [100] substrate by physical vapour deposition (PVD) and ion beam sputtering (IBS) processes, were analyzed and compared. Experiments were carried out using X-ray photoelectron spectroscopy (XPS) in depth profile, grazing angle X-ray diffraction (XRD) and transmission electron microscopy (TEM). Both layers exhibited a good stoichiometry and a low level of contamination. The sample grown by IBS revealed a more homogeneous and regular columnar microstructure than the other one.

Externe Organisation(en)

Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Laser Zentrum Hannover e.V. (LZH)
Universitat de Barcelona (UB)

Typ

Artikel

Journal

Thin Solid Films

Band

360

Seiten

133-138

Anzahl der Seiten

6

ISSN

0040-6090

Publikationsdatum

11.02.2000

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Elektronische, optische und magnetische Materialien, Oberflächen und Grenzflächen, Oberflächen, Beschichtungen und Folien, Metalle und Legierungen, Werkstoffchemie

Elektronische Version(en)

https://doi.org/10.1016/S0040-6090(99)00738-5 (Zugang: Unbekannt)