Formation of low work function patches in the NO + H₂ reaction on a roughened Rh(110) surface

verfasst von

S. K. Shaikhutdinov, A. Schaak, R. Imbihl

Abstract

Chemical wave patterns in the NO + H₂ reaction on Rh(110) have been investigated on a surface roughened by Ar⁺ ion sputtering (4 keV, exposure 10¹⁶ ions/cm²). The study has been conducted in the 10^-6-10^-5 mbar range employing photoemission electron microscopy (PEEM) as a spatially resolving method. While the formation of rectangularly and elliptically shaped target patterns is not notably influenced by the roughness produced by sputtering, patches with reduced work functions develop on the surface upon collision of wave fronts. We attribute these patches, which are absent on a smooth Rh(110) surface, to a subsurface oxygen species whose formation is facilitated by structural defects on the surface.

Organisationseinheit(en)

Institut für Physikalische Chemie und Elektrochemie

Externe Organisation(en)

Boreskov Institute of Catalysis SB RAS

Typ

Artikel

Journal

Surface science

Band

391

Seiten

L1172-L1177

ISSN

0039-6028

Publikationsdatum

26.11.1997

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Physik der kondensierten Materie, Oberflächen und Grenzflächen, Oberflächen, Beschichtungen und Folien, Werkstoffchemie

Elektronische Version(en)

https://doi.org/10.1016/S0039-6028(97)00609-2 (Zugang: Geschlossen)